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Book Cover
E-RESOURCE
Author Okoroanyanwu, Uzodinma.

Title Chemistry and lithography [electronic resource] / Uzodinma Okoroanyanwu.

Published Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) : SPIE, 2010.

Copies

Location Call No. Status
 UniM INTERNET resource    AVAILABLE
Physical description 1 online resource (xxv, 861 p.) : ill.
Series Press monograph ; 192
SPIE Press monograph ; PM192.
SPIE Digital Library.
Notes "SPIE digital library."
Contents Part I: Origins, inventions, and the evolution of lithography. 1. Introduction to lithography -- 2. Invention of lithography and photolithography -- 3. Optical and chemical origins of lithography -- 4. Evolution of lithography.
Part II: Lithographic chemicals. 5. Lithographic chemicals -- 6. Negative resists -- 7. Positive resists -- 8. General considerations on the radiation and photochemistry of resists -- 9. Antireflection coatings and reflectivity control.
Part III: The practice of lithography. 10. Stone, plate, and offset lithography -- 11. The semiconductor lithographic process -- 12. Lithographic modeling -- 13. Optical lithography -- 14. X-ray and extreme-ultraviolet lithographies -- 15. Charged particle lithography -- 16. Lithography in integrated circuit device fabrication -- 17. Advanced resist processing and resist resolution limit issues -- Afterword.
Restrictions Restricted to subscribers or individual electronic text purchasers.
Summary This book provides a comprehensive treatment of the chemical phenomena in lithography in a manner that is accessible to a general readership. The book presents topics on the optical and charged particle physics practiced in lithography, with a broader view of how the marriage between chemistry and optics has made possible the print and electronic revolutions of the digital age. The related aspects of lithography are thematically presented to convey a unified view of the developments in the field over time, from the very first recorded reflections on the nature of matter to the latest developments at the frontiers of lithography science and technology.
Other formats Also available in print version.
System notes Mode of access: World Wide Web.
System requirements: Adobe Acrobat Reader.
Notes Title from PDF title page (SPIE eBooks Web site, viewed Oct. 22, 2010).
Other author Society of Photo-optical Instrumentation Engineers.
Subject Lithography.
Chemistry, Technical.
Electronic books.
ISBN 9780819483997 (electronic)
0819475629 (print)
9780819475626 (print)
Standard Number 10.1117/3.821384