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LEADER 00000nam  2200493 a 4500 
003    SPIE 
005    20101102121739.0 
006    m    eo  d         
007    cr bn |||m|||a 
008    101022s2010    waua   fo     000 0 eng d 
010    |z2009036266 
019    9780819483997 
020    9780819483997|q(electronic) 
020    |z0819475629 (print) 
020    |z9780819475626 (print) 
024 7  10.1117/3.821384 
035    (OCoLC)693785973 
035    (CaBNVSL)gtp00544229 
040    CaBNVSL|cCaBNVSL|dCaBNVSL 
050  4 NE2425|b.O38 2010eb 
082 04 621.3815/31|222 
100 1  Okoroanyanwu, Uzodinma. 
245 10 Chemistry and lithography|h[electronic resource] /
       |cUzodinma Okoroanyanwu. 
260    Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 
       USA) :|bSPIE,|c2010. 
300    1 online resource (xxv, 861 p.) :|bill. 
490 1  Press monograph ;|v192 
500    "SPIE digital library." 
505 0  Part I: Origins, inventions, and the evolution of 
       lithography. 1. Introduction to lithography -- 2. 
       Invention of lithography and photolithography -- 3. 
       Optical and chemical origins of lithography -- 4. 
       Evolution of lithography. 
505 0  Part II: Lithographic chemicals. 5. Lithographic chemicals
       -- 6. Negative resists -- 7. Positive resists -- 8. 
       General considerations on the radiation and photochemistry
       of resists -- 9. Antireflection coatings and reflectivity 
       control. 
505 0  Part III: The practice of lithography. 10. Stone, plate, 
       and offset lithography -- 11. The semiconductor 
       lithographic process -- 12. Lithographic modeling -- 13. 
       Optical lithography -- 14. X-ray and extreme-ultraviolet 
       lithographies -- 15. Charged particle lithography -- 16. 
       Lithography in integrated circuit device fabrication -- 
       17. Advanced resist processing and resist resolution limit
       issues -- Afterword. 
506    Restricted to subscribers or individual electronic text 
       purchasers. 
520    This book provides a comprehensive treatment of the 
       chemical phenomena in lithography in a manner that is 
       accessible to a general readership. The book presents 
       topics on the optical and charged particle physics 
       practiced in lithography, with a broader view of how the 
       marriage between chemistry and optics has made possible 
       the print and electronic revolutions of the digital age. 
       The related aspects of lithography are thematically 
       presented to convey a unified view of the developments in 
       the field over time, from the very first recorded 
       reflections on the nature of matter to the latest 
       developments at the frontiers of lithography science and 
       technology. 
530    Also available in print version. 
538    Mode of access: World Wide Web. 
538    System requirements: Adobe Acrobat Reader. 
588    Title from PDF title page (SPIE eBooks Web site, viewed 
       Oct. 22, 2010). 
650  0 Lithography. 
650  0 Chemistry, Technical. 
655  0 Electronic books. 
710 2  Society of Photo-optical Instrumentation Engineers. 
776 08 |iPrint version:|z0819475629|z9780819475626|w(DLC)  
       2009036266 
830  0 SPIE Press monograph ;|vPM192. 
830  0 SPIE Digital Library. 
856 40 |3SPIE|uhttp://dx.doi.org.ezp.lib.unimelb.edu.au/10.1117/
       3.821384|zConnect to ebook (University of Melbourne only) 
990    Batch Ebook load by Library Systems - do not edit, delete 
       or attach any records. 
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