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SUBJECTS (1-11 of 11)
Semiconductors -- Etching.
1
Cover Art
    E-RESOURCE c2009

Advanced processes for 193-nm immersion lithography / [electronic resource] / Yayi Wei, Robert L. Brainard.

    Wei, Yayi.
Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) : SPIE,        1 online resource (xix, 315 p. : ill.) : digital file. c2009
2
Cover Art
    E-RESOURCE 1991

Dry etching for VLSI / A.J. van Roosmalen, J.A.G. Baggerman, S.J.H. Brader.

    Roosmalen, A. J. van.
New York : Plenum Press,        1 online resource (xvii, 237 pages) : illustrations. 1991
3
Cover Art
    E-RESOURCE 2014

Dry etching technology for semiconductors / Kazuo Nojiri.

    Nojiri, Kazuo, author.
Cham : Springer,        1 online resource (xiii, 116 pages) : illustrations 2014
6
Cover Art
    E-RESOURCE c1999

Lithography process control / [electronic resource] / Harry J. Levinson.

    Levinson, Harry J.
Bellingham, Wash. : SPIE Optical Engineering Press,        1 online resource (x, 190 p.) : ill. c1999
7
Cover Art
    E-RESOURCE c1999

Lithography process control / [electronic resource] / Harry J. Levinson.

    Levinson, Harry J.
Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) : SPIE,        1 online resource (x, 190 p. : ill.) : digital file. c1999
8
Cover Art
    E-RESOURCE 2017

Nanofabrication : principles to laboratory practice / Andrew Sarangan, University of Dayton, OH, USA.

    Sarangan, Andrew, author.
Boca Raton : CRC Press, Taylor & Francis Group,        1 online resource 2017
9
Cover Art
    E-RESOURCE 2010

Optical lithography here is why / [electronic resource] : Burn J. Lin.

    Lin, Burn Jeng, 1942-
Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) : SPIE,        1 online resource (xiv, 477 p. : ill.) : digital file. 2010
10
Cover Art
    E-RESOURCE 2010

Optical lithography here is why / [electronic resource] : Burn J. Lin.

    Lin, Burn Jeng, 1942-
Bellingham, Wash. : SPIE,        1 online resource (xiv, 477 p.) : ill. 2010
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