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Title Silicon technologies [electronic resource] : ion implantation and thermal treatment / edited by Annie Baudrant.

Published London : ISTE ; Hoboken, N.J. : Wiley, 2011.


Location Call No. Status
Physical description xvii, 337 p. : ill.
Bibliography Includes bibliographical references and index.
Summary The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
Reproduction Electronic reproduction. Ann Arbor, MI : ProQuest, 2015. Available via World Wide Web. Access may be limited to ProQuest affiliated libraries.
Other author Baudrant, Annie.
ProQuest (Firm)
Subject Semiconductor doping.
Ion implantation.
Semiconductors -- Heat treatment.
Electronic books.
ISBN 9781848212312 (hc)
9781118601112 (e-book)